EFFECT OF RF PLASMA ON SILICON NITRIDE DEPOSITION FROM SiF4/NH3 GAS MIXTURES IN A HOT WALL REACTOR
- 著者名:
- 掲載資料名:
- Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 190
- 発行年:
- 1991
- 開始ページ:
- 107
- 終了ページ:
- 112
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990791 [1558990798]
- 言語:
- 英語
- 請求記号:
- M23500/190
- 資料種別:
- 国際会議録
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