Blank Cover Image

IN SITU STRESS MEASUREMENTS DURING THE FORMATION OF TiSi2 C49 ON Si WAFERS

著者名:
掲載資料名:
Thin films : stresses and mechanical properties II : symposium held April 16-19, 1990, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
188
発行年:
1990
開始ページ:
61
終了ページ:
66
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990777 [1558990771]
言語:
英語
請求記号:
M23500/188
資料種別:
国際会議録

類似資料:

1 国際会議録 In-situ wafer curvature measurements during rapid thermal annealing of Si(100)wafers

Jongste,J.F., Oosterlaken,T.G.M., Bart,G.C.J., Janssen,G.C.A.M., Radelaar,S.

SPIE-The International Society for Optical Engineering
7 国際会議録 IN SITU STRESS MEASUREMENTS DURING THE REACTION OF WF6 WITH Si(100)

Leusink, G.J., Heerkens, C.Th.H., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
2 国際会議録 STRESS IN TITANIUM DISILICIDE LAYER, DURING AND AFTER FORMATION

Jongste,J. F., Prins, F.E., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
8 国際会議録 EVOLUTION OF INTRINSIC STRESS DURING NUCLEATION AND GROWTH OF POLYCRYSTALLINE TUNGSTEN FILMS BY CHEMICAL VAPOR DEPOSITION

Leusink, G. J., Oosterlaken, T. G. M., Janssen, G. C. A.M., Radelaar, S.

Materials Research Society
3 国際会議録 EVOLUTION OF STRESS DURING FORMATION OF TITANIUM DISILICIDE BY RTA AND TUBE FURNACE ANNEALING

Jongste, J.F., Loopstra, O.B., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
9 国際会議録 The Kinetics of Tungsten Deposition from a H2/WF6- Mixture Studied by In-Situ Laser Raman Scattering

Oosterlaken, T.G.M., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S.

Electrochemical Society
4 国際会議録 TIME RESOLVED X-RAY DIFFRACTION STUDY OF THE TRANSFORMATION KINETICS OF TiSi2-C49 IN AMORPHOUS Si/Ti MULTILAYERS

Sariel, J., Chen, Haydn, Jongste, J. F., Radelaar, S.

MRS - Materials Research Society
10 国際会議録 Kinetics of Cu Segregation in Al-Cu(1 at.% Cu) Interconnects Studied by Resistance Measurements

Kalkman, A. J., Verbruggen, A. H., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
5 国際会議録 Isothermal Stress Relaxation in Al, AlCu and AlVPd Films

Lokker, J. P., Jongste, J. F., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
11 国際会議録 In Situ Characterization of Precipitation in Al-Cu Thin Films

Lokker, J. P., Bottger, A. J., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
6 国際会議録 Isothermal Stress Relaxation in Al, AlCu and AlVPd Films

Lokker, J. P., Jongste, J. F., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
12 国際会議録 In Situ Characterization of Precipitation in Al-Cu Thin Films

Bottger, A. J., Janssen, G. C. A. M., Lokker, J. P., Radelaar, S.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12