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EVIDENCE FOR STRONGLY ENHANCED PARAGMENTIC DEFECT CREATION IN LOW-TEMPERATURE PECVD SiO2 FILMS

著者名:
掲載資料名:
Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
165
発行年:
1990
開始ページ:
119
終了ページ:
126
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990531 [1558990534]
言語:
英語
請求記号:
M23500/165
資料種別:
国際会議録

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