FABRICATION OF HIGH QUALITY SILICIDE LAYERS BY ION IMPLANTATION
- 著者名:
Reeson, Karen J. De Veirman, Ann Gwilliam, Russell Jeynes, Chris Sealy, Brian J. Landuyt, J. Bussmann, Udo Lindner, J. K. N. te Kaat, e. H. - 掲載資料名:
- Ion beam processing of advanced electronic materials : symposium held April 25-27, 1989, San Diego, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 147
- 発行年:
- 1989
- 開始ページ:
- 217
- 終了ページ:
- 222
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990203 [1558990208]
- 言語:
- 英語
- 請求記号:
- M23500/147
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
9
国際会議録
Lattice Damage of Relaxed Si1-xGex Alloys of Various Composition Implanted with 2 MeV Si Ions
Trans Tech Publications |
Trans Tech Publications |
Materials Research Society |
Electrochemical Society | |
Trans Tech Publications |
MRS - Materials Research Society |