PLASMA IMMERSION ION IMPLANTATION FOR IMPURITY GETTERING IN SILICON
- 著者名:
Wong, H. Qian, X. Y. Cheung, N. W. Lieverman, M. A. Brown, I. G. Yu, K. M. - 掲載資料名:
- Ion beam processing of advanced electronic materials : symposium held April 25-27, 1989, San Diego, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 147
- 発行年:
- 1989
- 開始ページ:
- 91
- 終了ページ:
- 96
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990203 [1558990208]
- 言語:
- 英語
- 請求記号:
- M23500/147
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Kluwer Academic Publishers |
2
国際会議録
SELECTIVE COPPER PLATING IN SILICON DIOXIDE TRENCHES WITH METAL PLASMA IMMERSION ION IMPLANTATION
Materials Research Society |
Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |