SILICON CARBIDE STRUCTURES PREPARED BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION

SILICON CARBIDE STRUCTURES PREPARED BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION

著者名:

掲載資料名:

Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

146

発行年:

1989

開始ページ:

103

終了ページ:

108

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990197 [1558990194]

言語:

英語

請求記号:

M23500/146

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015631
シリーズID:	PA00000011
会議名:	Symposium on rapid thermal annealing/chemical vapor deposition and integrated processing
回次:	1989
会議開催地:	San Diego, CA, USA
会議開催年:	1989.04.25-1989.04.28

類似資料:

1 国際会議録 CHEMICAL VAPOR DEPOSITION OF POLYCRYSTALLINE SILICON IN A RAPID THERMAL PROCESSOR Liao, Jimmy C., Crowley, John L., Kamina, Ted I. Materials Research Society	7 国際会議録 RAPID THERMAL CHEMICAL VAPOR DEPOSITION: SELECTIVE EPITAXIAL SILICON GROWTH (SEG) Osenback, J. W., Ku, Y. H., Kermani, A. Materials Research Society
2 国際会議録 IN-SITU DOPED POLYCRYSTALLINE SILICON DEPOSITED BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION USING TERTIARYBUTYLPHOSPHINE Liao, Jimmy C., Kim, Ki-Bum, Maillot, Philippe Materials Research Society	8 国際会議録 *RAPID THERMAL CHEMICAL VAPOR DEPOSITION OF GERMANIUM AND GERMANIUM/SILICON ALLOYS ON SILICON: NEW APPLICATIONS IN THE FABRICATION OF MOS TRANSISTORS Ozturk, M. C., Grider, D. T., Ashburn, S. P., Sanganeria, M., Wortman, J. J. Materials Research Society
3 国際会議録 SILICON-CARBON RANDOM ALLOY EPITAXY ON SILICON BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION Mi, J., Letourneau, P., Ganiere, J. -D., Gailhanou, M., Dutoit, M., Dubois, C., Dupuy, J. C. MRS - Materials Research Society	9 国際会議録 Polymorphous Silicon Nanowires Synthesized by Plasma-Enhanced Chemical Vapor Deposition Zeng, X.B., Liao, X.B., Diao, H.W., Hu, Z.H., Xu, Y.Y., Zhang, S.B., Chen, C.Y., Chen, W.D., Kong, G.L. Materials Research Society
4 国際会議録 Structural and Optical Properties of SiGeC Alloys and Multi-Quantum Wells Grown by Rapid Thermal Chemical Vapor Deposition Boucaud, P., Guedj, C., Julien, F. H., Bouchier, D., Boulmer, J., Lourtioz, J. -M., Bodnar, S., Regolini, J. L., … MRS - Materials Research Society	10 国際会議録 GATE QUALITY OXIDES PREPARED BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION Kuehn, R. T., Xu, X., Holcombe, D. J., Misra, V., Wortman, J. J., Hauser, J. R., Wang, Q. -F., Maher, D. M. MRS - Materials Research Society
5 国際会議録 Pre-Deposition Treatments for Selective Rapid Thermal Chemical Vapor Deposition of TiSi2 on Arsenic-Implanted Silicon Substrates Fang, H., Oeztuerk, M.C., O'Neil, P.A., Seebaner, E. Electrochemical Society	11 国際会議録 SUBSTRATE EFFECTS ON THE STRUCTURE AND OPTICAL PROPERTIES OF EPITAXIAL PbTiO3 THIN FILMS PREPARED BY METAL-ORGANIC CHEMICAL VAPOR DEPOSITION Foster, C. M., Li, Z., Bai, G. R., You, H., Guo, D., Chang, H. L. M. MRS - Materials Research Society
6 国際会議録 WELL-RESOLVED BAND-EDGE PHOTOLUMINESCENCE FROM STRAINED Si1-xGex LAYERS GROWN BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION Sturm, J.C., Schwartz, P.V., Manoharan, H., Mi, Q., Lenchyshyn, L.C., Thewalt, M.L.W., Rowell. N.L., Noel, J.-P., … Materials Research Society	12 国際会議録 Novel Applications of Rapid Thermal Chemical Vapor Deposition for Nanoscale MOSFET's Sturm, J. C., Yang, M., Chang, C. L., Carroll, M. S. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12