CHEMICAL REACTION PATHWAYS FOR THE DEPOSITION OF AMORPHOUS SILICON-HYDROGEN ALLOYS BY REMOTE PLASMA ENHANCED CVD

CHEMICAL REACTION PATHWAYS FOR THE DEPOSITION OF AMORPHOUS SILICON-HYDROGEN ALLOYS BY REMOTE PLASMA ENHANCED CVD

著者名:

掲載資料名:

Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

131

発行年:

1989

開始ページ:

263

終了ページ:

268

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990043 [1558990046]

言語:

英語

請求記号:

M23500/131

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015616
シリーズID:	PA00000011
会議名:	Symposium on chemical perspectives of microelectronic materials
回次:	1988
会議開催地:	Boston, MA, USA
会議開催年:	1988.11.30-1988.12.02

類似資料:

1 国際会議録 GROWTH OF a-Si:H FILMS BY REMOTE PLASMA ENHANCED CVD (RPECVD) Parsons, G.N., Tsu, D.V., Lucovsky, G. Materials Research Society	7 国際会議録 THE ELECTRICAL PROPERTIES OF SILICON OXIDE DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD) Kim, Sang S., Tsu, D. V., Lucovsky, G. Materials Research Society
2 国際会議録 THE GROWTH OF SILICON OXIDE FILMS BY REMOTE PLASMA ENHANCED CVD Tsu, D.V., Lucovsky, G. Materials Research Society	8 国際会議録 DEPOSITION OF THIN INSULATING FILMS BY PLASMA ENHANCED CVD Lucovsky, G., Richard, P.D., Tsu, D.V., Markunas, R.J. Materials Research Society
3 国際会議録 *CONTROL OF BONDED SiH IN SILICON OXIDES DEPOSITED BY REMOTE PLASMA ENHANCED CVD Tsu, D. V., Parsons, G. N., Lucovsky, G., Watkins, M. W. Materials Research Society	9 国際会議録 Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films Santos-Filho, P., Koh, K., Stevens, G., Lucovsky, G. MRS - Materials Research Society
4 国際会議録 DEPOSITION OF DIELECTRIC FILMS BY REMOTE PLASMA ENHANCED CVD Lucovsky G., Tsu, D.V., Markunas R.J. Materials Research Society	10 国際会議録 DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE Si,C ALLOY THIN FILMS BY A REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS Wang, C., Lucovsky, G., Nemanich, R.J. Materials Research Society
5 国際会議録 BONDED HYDROGEN IN SILICON OXIDE THIN FILMS DEPOSITED BY REMOT PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Tsu, D. V., Lucovsky, G. Materials Research Society	11 国際会議録 Bonding of Hydrogen and Deuterium in Silicon Nitride Films Prepared by Remote Plasma Enhanced Chemical Vapor Deposition Stevens, G., Santos-Filho, P., Habermehl, S., Lucovsky, G. MRS - Materials Research Society
6 国際会議録 *THE ELECTRICAL PROPERTIES OF SILICON OXIDE DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD) Kim, Sang S., Tsu, D. V., Lucovsky, G. Materials Research Society	12 国際会議録 FORMATION OF MULTILAYER SiO2-SiOx HETEROSTRUCTURES BY CONTROL OF REACTION PATHWAYS IN REMOTE PECVD Tsu, D.V., Kim, S.S., Theil, J.A., Wang, Cheng, Lucovsky, G. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12