THERMAL STAIN MEASUREMENTS IN EPITAXIAL CoSi2/Si BY DOUBLE CRYSTAL X-RAY DIFFRACTION

THERMAL STAIN MEASUREMENTS IN EPITAXIAL CoSi2/Si BY DOUBLE CRYSTAL X-RAY DIFFRACTION

著者名:

Bai, Gang

掲載資料名:

Thin films : stresses and mechanical properties : symposium held November 28-30, 1988, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

130

発行年:

1989

開始ページ:

35

終了ページ:

40

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990036 [1558990038]

言語:

英語

請求記号:

M23500/130

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015615
シリーズID:	PA00000011
会議名:	Symposium on thin films
回次:	1988
会議開催地:	Boston, MA, USA
会議開催年:	1988.11.28-1988.11.30

類似資料:

1 国際会議録 MISORIENTED EPITAXIAL GROWTH OF (111)CoSi2 ON OFFSET (111)Si SUBSTRATES Bai, Gang, Jamieson, David N., Nicolet, Marc-A., Vreeland Jr., Thad Materials Research Society	7 国際会議録 WET OXIDATION OF EPITAXIAL Ge36Si64 ON (100)Si Liu, W.S., Bai, G., Nicolet, M.-A., Chern, C.H., Albert, V., Wang, K.L. Materials Research Society
2 国際会議録 ON THE CRITIAL LAYER THICKNESS OF STRAINED-LAYER HETERO-EPITAXIAL CoSi2 FILMS ONF < 111 > Si Jamieson, D. N., Bai, G., Kao, Y. C., Nieh, C. W., Nicolet, M-A., Wang, K. L. Materials Research Society	8 国際会議録 A MODEL FOR HETEROEPITAXY ON PATTERNED SUBSTRATES Kao, Y.C., Wang, K.L. Materials Research Society
3 国際会議録 CHARACTERIZATION OF EPITAXIAL CoSi2 FILMS GROWN ON Si Hamdi, a. H., Nicolet, M-A., Kao, Y, C., Tejwani, M., Wang, K L. Materials Research Society	9 国際会議録 Nondestructive measurement of layer thickness in double heterostructures x ray by double crystal diffraction Qu,Y., Li,X., Song,X., Zhang,X., Wang,L., Qie,X. SPIE-The International Society for Optical Engineering
4 国際会議録 PROPERTIES AND APPLICATION OF MOLECULAR BEAM EPITAXIAL SILICIDES Wang, K.L., Kao, Y.C. Materials Research Society	10 国際会議録 DEFECTS ANNEALING OF Si+ IMPLANTED GaAs AT RT AND 100°C Bai, G., Jamieson, D. N., Nicolet, M-A., Vreeland Jr., T. Materials Research Society
5 国際会議録 EPITAXIAL CoSi2/POROUS-SI STRAINED LAYER STRUCTURES GROWN BY MBE Kao, Y. C., Jamieson, D., Bai, G.,, Nieh, C. W., Lin, T. L., Wu, B. J., Chen, H. Y., Wang, K. L. Materials Research Society	11 国際会議録 IN-SITU X-RAY DIFFRACTION AND RESISTIVITY ANALYSIS OF CoSi2 PHASE FORMATION WITH AND WITHOUT A Ti INTERLAYER AT RAPID THERMAL ANNEALING RATES Cabral, C., Jr., Clevenger, L. A., Stephenson, G. B., Brauer, S., Morales, G., Ludwig, K. F., Jr. MRS - Materials Research Society
6 国際会議録 X-RAY DIFFRACTION DETERMINATION OF STRESSES IN THIN FILMS Vreeland, Jr. T., Dommann, A., Tsai, C.-J., Nicolet, M.-A. Materials Research Society	12 国際会議録 INVESTIGATION OF INTERFACE STATES ON MBE CoSi2/Si SCHOTTKY CONTACTS BY FORWARD BIAS CAPACITANCE MEASUREMENT Chen, H. Y., Kao, Y. C., Mii, Y. J., Wang, K. L. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12