EFFECT OF ION BOMBARDMENT ON THE DOPANT DIFFUSION DURING REACTIVE ION ETCHING (RIE) OF DIELECTRIC FILMS DEPOSITED ON SILICON
- 著者名:
- 掲載資料名:
- Processing and characterization of materials using ion beams : symposium held November 28-December 2, 1988, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 128
- 発行年:
- 1989
- 開始ページ:
- 731
- 終了ページ:
- 736
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990012 [1558990011]
- 言語:
- 英語
- 請求記号:
- M23500/128
- 資料種別:
- 国際会議録
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