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DAMAGE FORMATION IN SEMICONDUCTORS DURING MeV ION IMPLANTATION

著者名:
掲載資料名:
Processing and characterization of materials using ion beams : symposium held November 28-December 2, 1988, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
128
発行年:
1989
開始ページ:
593
終了ページ:
598
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990012 [1558990011]
言語:
英語
請求記号:
M23500/128
資料種別:
国際会議録

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