Blank Cover Image

MICROSTRUCTURE DEVELOPMENT IN THIN FILMS DURING DEPOSITION FROM THE VAPOR PHASE

著者名:
掲載資料名:
Electronic packaging materials science III : symposium held November 30-December 4, 1987, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
108
発行年:
1988
開始ページ:
395
終了ページ:
398
総ページ数:
4
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837760 [0931837766]
言語:
英語
請求記号:
M23500/108
資料種別:
国際会議録

類似資料:

1 国際会議録 IDENTIFICATION OF THE FAILURE MECHANISM OF A THIN FILM ON A THICK SUBSTRATE BY MEANS OF SYNCHROTRON X-RAY TOPOGRAPHY COMBINED WITH TRANSMISSION ELECTRON …

Goyal, D., Ng, W., King, A. H., Bilello, J. C.

Materials Research Society
7 国際会議録 Thin film dielectrics for electronics using combustion chemical vapor deposition

Lin, W-Y., Huang, H., Cullen, D. K., Shoup, S. S., Cousins, D., Schmitt, J. J., Hunt, A. T., Romanofsky, R. R., …

MRS-Materials Research Society
2 国際会議録 ELECTRON MICROSCOPE OBSERVATIONS OF MECHANISMS OF THIN FILM DELAMINATION FROM SUBSTRATES

Goyal, D., King, A.H.

Materials Research Society
8 国際会議録 THE RELATIONSHIP BETWEEN DEPOSITION CONDITIONS, MICROSTRUCTURE AND PROPERTIES OF RE-TM THIN FILMS

Lee, J-W., Cheng, S-C.N., Kryder, M.H., Laughlin, D.E.

Materials Research Society
3 国際会議録 Correlation of Stress and Phase Evolution in Thin Ta Films on Si (100) During Thermal Testing

French, B.L., Bilello, J.C.

Materials Research Society
9 国際会議録 THE ORIGIN OF ANOMALOUS STRAIN IN THIN SPUTTERED Mo FILMS ON Si(100)

Tao, J., Adams, D., Yasilove, S. M., Bilello, J. C.

Materials Research Society
4 国際会議録 Al-Ge PHASE SEPARATION DURING VAPOR DEPOSITION

Adams, C. D., Atzmon, M., Cheng, Y. -T., Srolovitz, D. J.

Materials Research Society
10 国際会議録 Chemical Vapor Deposition of Boron Phosphide Thin Films

Julia K.C. Abbott, J. Daniel Brasfield, Philip D. Rack, Gerd J. Duscher, Charles S. Feigerle

Materials Research Society
5 国際会議録 Phase transformations involved during silica, modified silica, and non-silica mesoporous organized thin films deposition. The role of evaporation

Grosso, D., Crepaldi, E. L., Illia, G. J. de A. A. Soler, Cagnol, F., Baccile, N., Babonneau, F., Albouy, P. A., …

Elsevier
11 国際会議録 PHYSICAL VAPOR DEPOSITION OF MULTICOMPONENT OXIDE THIN FILMS: TECHNIQUES, BASIC DEPOSITION PROCESSES AND FILM PROCESSING-MICROSTRUCTURE-PROPERTY RELATIONSHIPS

Auciello O., Kingon I. A., Krauss R. A., Lichtenwalner J. D.

Kluwer Academic Publishers
6 国際会議録 *PHASE SEPARATION DURING FILM DEPOSITION

Atzmon, M., Adams, C.D., Cheng, Y.-T., Srolovitz, D.J.

Materials Research Society
12 国際会議録 DEPOSITION OF HEAVILY-DOPED μc-SILICON THIN FILMS BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS (remote PECVD)

Wang, C:, Bjorkman, C.H., Lee, D.R., Williams, M.J., Lucovsky, G.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12