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EVIDENCE FOR OXYGEN CONCENTRATION CHANGES INDUCED BY LOW-TEMPERATURE 0-18 IMPLANTATION INTO A SIMOX BURIED-OXIDE LAYER

著者名:
Scalon, P. J.
Hemment, P. L. F.
Robinson, A. K.
Reeson, K. J.
Chater, R. J.
Kilner, J. A.
Harbeke, G.
さらに 2 件
掲載資料名:
Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
107
発行年:
1988
開始ページ:
141
終了ページ:
146
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837753 [0931837758]
言語:
英語
請求記号:
M23500/107
資料種別:
国際会議録

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