SUBMICRON ROUGHNESS DETERMINATION AT THE Si-Si02 INTERFACE AND CORRELATIONS TO PROCESSING STEPS AND ELECTRONIC PROPERTIES

SUBMICRON ROUGHNESS DETERMINATION AT THE Si-Si02 INTERFACE AND CORRELATIONS TO PROCESSING STEPS AND ELECTRONIC PROPERTIES

著者名:

掲載資料名:

SiO[2] and its interfaces : symposium held November 30-December 5, 1987, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

105

発行年:

1988

開始ページ:

247

終了ページ:

252

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837739 [0931837731]

言語:

英語

請求記号:

M23500/105

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015591
シリーズID:	PA00000011
会議名:	Symposium on SiO2 and its interfaces
回次:	1987
会議開催地:	Boston, MA, USA
会議開催年:	1987.11.30-1987.12.05

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