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A COMPARISON OF DIFFERENT TECHNIQUES FOR THE RAPID THERMAL ANNEALING OF ION IMPLANTS IN SILICON

著者名:
掲載資料名:
Fundamentals of beam-solid interactions and transient thermal processing : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
100
発行年:
1988
開始ページ:
731
終了ページ:
736
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837685 [0931837685]
言語:
英語
請求記号:
M23500/100
資料種別:
国際会議録

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