A METHOD FOR NON-INTRUSIVELY DETERMINING ION IMPACT CURRENT DENSITY AND ENERGY DISTRIBUTION IN CAPACITIVELY COUPLED RF PLASMAS
- 著者名:
- Savas, S. E.
- 掲載資料名:
- Plasma processing and synthesis of materials : symposium held April 21-23, 1987, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 98
- 発行年:
- 1987
- 開始ページ:
- 61
- 終了ページ:
- 66
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837654 [0931837650]
- 言語:
- 英語
- 請求記号:
- M23500/98
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
ESTIMATION OF ION IMPACT ENERGIES AND ELECTRODE SELF-BIAS VOLTAGE IN CAPACITIVE RF DISCHARGES
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Society of Vacuum Coaters |
Electrochemical Society |
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society |