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A METHOD FOR NON-INTRUSIVELY DETERMINING ION IMPACT CURRENT DENSITY AND ENERGY DISTRIBUTION IN CAPACITIVELY COUPLED RF PLASMAS

著者名:
Savas, S. E.  
掲載資料名:
Plasma processing and synthesis of materials : symposium held April 21-23, 1987, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
98
発行年:
1987
開始ページ:
61
終了ページ:
66
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837654 [0931837650]
言語:
英語
請求記号:
M23500/98
資料種別:
国際会議録

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