*DIRECT FORMATION OF THIN FILMS AND EPITAXIAL OVERLAYERS AT LOW TEMPERATURES USING A LOW-ENERGY (10-500 eV) ION BEAM DEPOSITION SYSTEM

*DIRECT FORMATION OF THIN FILMS AND EPITAXIAL OVERLAYERS AT LOW TEMPERATURES USING A LOW-ENERGY (10-500 eV) ION BEAM DEPOSITION SYSTEM

著者名:

Zuhr, R. A

掲載資料名:

Materials modification and growth using Ion beams : symposium held April 21-23, 1987, Anaheim, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

93

発行年:

1987

開始ページ:

243

終了ページ:

252

総ページ数:

10

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837609 [093183760X]

言語:

英語

請求記号:

M23500/93

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015579
シリーズID:	PA00000011
会議名:	Symposium on materials modification and growth using ion beams
回次:	1987
会議開催地:	Anaheim, CA, USA
会議開催年:	1987.04.21-1987.04.23

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2 国際会議録 *INVESTIGATIONS OF LOW-TEMPERATURE EPITAXY, ION DAMAGE, AND REACTIVE-ION CLEANING UTILIZING ION BEAM DEPOSITION Appleton, B.R., Zuhr, R.A., Noggle, T.S., Herbots, N., Pennycook, S.J. Materials Research Society	8 国際会議録 *EPITAXY AND CHEMICAL REACTIONS DURING THIN FILM FORMATION FROM LOW ENERGY IONS: NEW KINETIC PATHWAYS, NEW PHASES AND NEW PROPERTIES Herbots, Nicole, Hellman, O. C., Vancauwenberghe, O. Materials Research Society
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4 国際会議録 HETEROEPITAXY ON GaAs ON Si AND Ge BY LOW-ENERGY ION BEAM DEPOSITION USING ALTERNATING BEAMS Haynes, T. E., Zuhr, R. A., Pennycook, S. J,. Materials Research Society	10 国際会議録 DAMAGE TO CRYSTALLINE SILICON FOLLOWING IMPLANTATION BY LOW ENERGY SILICON IONS Levin, Y., Herbots, N, Dunham, S. Materials Research Society
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