ADHESION OF REACTIVE ION IMPLANTED COPPER FILMS ON A1203 AND Si02

ADHESION OF REACTIVE ION IMPLANTED COPPER FILMS ON A1203 AND Si02

著者名:

掲載資料名:

Materials modification and growth using Ion beams : symposium held April 21-23, 1987, Anaheim, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

93

発行年:

1987

開始ページ:

41

終了ページ:

48

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837609 [093183760X]

言語:

英語

請求記号:

M23500/93

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015579
シリーズID:	PA00000011
会議名:	Symposium on materials modification and growth using ion beams
回次:	1987
会議開催地:	Anaheim, CA, USA
会議開催年:	1987.04.21-1987.04.23

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1 国際会議録 FORMATION OF BURIED TiSi2 LAYERS IN SINGLE CRYSTAL SILICON BY ION IMPLANTATION Madakson, P., Clark, G. J., Legoues, F. K., d'Heurle, F. M., Baglin, J. E. E. Materials Research Society	7 国際会議録 ADHESION STUDIES OF Au FILMS ON GaAs USING ION-ASSISTED DEPOSITION TECHNIQUES Kellock, A.J., Bardin, T.T., Wang, P-W., Baglin, J.E.E., Pronko, J.G. Materials Research Society
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5 国際会議録 Interface Tailoring to Enhance Thin Film Adhesion -a Review Baglin E. E. J. Kluwer Academic Publishers	11 国際会議録 ION IMPLANTATION TO INHIBIT CORROSION OF COPPER Ding, P. J., Lanford, W. A., Hymes, S., Murarka, S. P. Materials Research Society
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