ON THE CRITIAL LAYER THICKNESS OF STRAINED-LAYER HETERO-EPITAXIAL CoSi2 FILMS ONF < 111 > Si
- 著者名:
Jamieson, D. N. Bai, G. Kao, Y. C. Nieh, C. W. Nicolet, M-A. Wang, K. L. - 掲載資料名:
- Heteroepitaxy on silicon II : symposium held April 21-23, 1987, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 91
- 発行年:
- 1987
- 開始ページ:
- 479
- 終了ページ:
- 484
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837586 [0931837588]
- 言語:
- 英語
- 請求記号:
- M23500/91
- 資料種別:
- 国際会議録
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11
国際会議録
Dopant activation and epitaxial regrowth in p-implanted pseudomorphic Ge0.12Si0.88 layers on Si(100)
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