a-Si:H FILMS PREPARED BY ECR PLASMA ENHANCED CVD

a-Si:H FILMS PREPARED BY ECR PLASMA ENHANCED CVD

著者名:

掲載資料名:

Interfaces, superlattices, and thin films : symposium held December 1-6, 1986, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

77

発行年:

1987

開始ページ:

217

終了ページ:

222

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837562 [0931837561]

言語:

英語

請求記号:

M23500/77

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015562
シリーズID:	PA00000011
会議名:	Symposium on interfaces, superlattices, and thin films
回次:	1986
会議開催地:	Boston, MA, USA
会議開催年:	1986.12.01-1986.12.06

類似資料:

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2 国際会議録 Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques Shim, J.H., Cho, N.H., Kim, Y.J., Whang, C.M., Cho, W.S., Yoo, Y.C., Kim, J.G., Kwon, Y.J. Trans Tech Publications	8 国際会議録 PLASMA PARAMETER AND FILM QUALITY IN THE ECR-PLASMA-CVD Nakayama, Y., Kondoh, M., Hitsuishi, K, Kawamura, T. Materials Research Society
3 国際会議録 DEFECT STRUCTURE OF SiON FILMS PREPARED BY ECR PLASMA CVD METHOD Izumi, T., Matsumori, T., Kitagawa, M., Hirao, T. Materials Research Society	9 国際会議録 Low Temperature Fabrication of (Ba,Sr)TiO3 Thin Films by ECR Plasma CVD Kato, Y., Yabuta, H., Sone, S., Yamaguchi, H., Iizuka, T., Yamamichi, S., Lesaicherre, P-Y., Nishimoto, S., Yoshida, M. MRS - Materials Research Society
4 国際会議録 Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition Chen, X-H., Tolbert, L. M., Ning, Z. Y., Hess, D. W. MRS - Materials Research Society	10 国際会議録 Stress of ECR Plasma CVD Si3N4 Films on FZ-Si Zaitsu, Y., Shimizu, T., Matsumoto, S., Yosbida, M., Abe, T., Arai, E. Electrochemical Society
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