Blank Cover Image

THE CHARACTERIZATION OF SILICON DAMAGED BY LOW ENERGY ARGON ION ETCHING

著者名:
掲載資料名:
Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
76
発行年:
1987
開始ページ:
171
終了ページ:
178
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837425 [0931837421]
言語:
英語
請求記号:
M23500/76
資料種別:
国際会議録

類似資料:

1 国際会議録 VARIATIONS IN THE REFRACTIVE INDEX OF THE NEARSURFACE REGION OF LOW ENERGY ION BOMBARDED SILICON

Pettit, R.B., Panitz, J.K.G.

Materials Research Society
7 国際会議録 MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING

Hwang, D.K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society
2 国際会議録 OBSERVATIONS OF DAMAGE AND TRANSPORT OF HYDROGEN IN ION BOMBARDED POLYCRYSTALLINE SILICON

Sharp, D. J., Panitz, J. K. G., Seager, C. H.

North Holland
8 国際会議録 X-RAY AND RAMAN STUDIES OF MeV ION IMPLANTED GaInAs/GaAs

Wie, C. R., Xie, K., Burns, G., Dacol, F. H., Pettit, D., Woodall, J. M.

Materials Research Society
3 国際会議録 Distributed Bragg grating sensing technique for test article damage detection and monitoring

Duncan, R.G., Childers, B.A., Gifford, D.K., Pettit, D.E., Hickson, A.W., Brown, T.L.

SPIE-The International Society for Optical Engineering
9 国際会議録 LONG RANGE COULOMB EFFECTS ON HYDROGEN DEBONDING FROM BORON ACCEPTORS IN SILICON

Anderson, R.A., Seager, C.H.

Materials Research Society
4 国際会議録 Plasma Etching for the Application to Low-K Dielectrics Devices

J.W. Lee, H.W. Kim, J.W. Han, M.S. Kim, B.D. Yoo, M.H. Kim, C.H. Lee, C.H. Lim, S.K. Hwang, C. Lee, D.J. Chung, S.G. …

Trans Tech Publications
10 国際会議録 Low-Energy Ion-Beam Etching

J.R. Kahn, H.R. Kaufman

Society of Vacuum Coaters
5 国際会議録 Heavy-Ion Damage to Magnesium Diboride Films: Electrical Transport-Current Characterization

Kerchner, H.R., Cantoni, C., Paranthaman, M., Christen, D.K., Christen, H.M., Thompson, J.R., Miller, D.J.

Materials Research Society
11 国際会議録 Characterization of Damage Produced by Argon Plasma Immersion Ion Implantation in Crystalline Silicon

Rajkumar, Kumar, Mukesh, George, P.J., Chari, K.S., Mukherjee, S.

SPIE-The International Society for Optical Engineering
6 国際会議録 LOW DAMAGE MAGNETRON REACTIVE ION ETCHING OF GaAs

McLane, G., Meyyappan, M., Cole, M. W., Lee, H. S., Lareau, R., Namaroff, M., Sasserath, J.

Materials Research Society
12 国際会議録 Effect of low energy hydrogen implants on damage caused by argon ion beam etching

Climent, A., Wang, J. S., Fonash, S. J.

North-Holland
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12