ANISOTROPIC AND SELECTIVE REACTIVE ION ETCHING OF SiC IN CHF3 AND OXYGEN PLASMA

ANISOTROPIC AND SELECTIVE REACTIVE ION ETCHING OF SiC IN CHF3 AND OXYGEN PLASMA

著者名:

掲載資料名:

Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

76

発行年:

1987

開始ページ:

157

終了ページ:

162

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837425 [0931837421]

言語:

英語

請求記号:

M23500/76

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015561
シリーズID:	PA00000011
会議名:	Symposium on science and technology of microfabrication
回次:	1986
会議開催地:	Boston, MA, USA
会議開催年:	1986.12.04-1986.12.05

類似資料:

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2 国際会議録 Reactive Ion Etching Process of 4H-SiC Using the CHF3/O2 Mixtures and a Post-O2 Plasma-Etching Process Kang, S. C., Shin, M.W. Trans Tech Publications	8 国際会議録 EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING Park, H.-H., Kwon, K.-H., Lee, S.-H., Nahm, S., Lee, J.-W., Koak, B.-H., Suh, K.-S., Kwon, O.-J., Lee, J.-L., Yeom, … MRS - Materials Research Society
3 国際会議録 Reactive Ion Etching Process of 4H-SiC Using the CHF3/O2 Mixtures and a Post-O2 Plasma-Etching Process Kang, S.C., Shin, M.W. Trans Tech Publications	9 国際会議録 Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas Reyes-Betanzo, C., Moshkalyov, S.A., Ramos, A.C.S., Cotta, M.A., Swart, J.W. Electrochemical Society
4 国際会議録 Si NANOSTRUCTURE FABRICATION BY Ga+ FIB SELECTIVE DOPING AND ANISOTROPIC ETCHING Steckl, A.J., Mogul, H.C., Mogren, S. Materials Research Society	10 国際会議録 CHARACTERISTICS AND RECOVERY OF Si SURFACES PLASMA ETCHING IN CHF3/C2F6 Park, H.-H., Kwon, K.H., Koak, B.-H., Lee, S.-M., Kwon, O-J., Kim, B.-W., Lee, J.-W., Yoo, J.-B., Sung, Y.-K. Materials Research Society
5 国際会議録 Reactive Ion Etching of TiN, TiAlN, CrN and TiCN Films in CF4/O2 and CHF3/O2 Plasmas Leech, Patrick W., Reeves, G. K., Holland, A. S. Materials Research Society	11 国際会議録 Nitride and Oxide Etching in CHF3/CF4/He Plasma: Loading Ef- fects and Selectivity Franssila, S., Kattelus, H.P. Electrochemical Society
6 国際会議録 Sub-micron Patterning of 6H-SiC by Anisotropic Reactive Ion Etching Saxena, V., Stecki, A.J., Bordonaro, G. Electrochemical Society	12 国際会議録 ANISOTROPIC REACTIVE ION ETCHING OF SUBMICRON W FEATURES IN CF4 OR SF6 PLASMAS Fullowan, T. R., Ren, F., Pearton, S. J., Mahoney, G. E., Kostelak, R. L. Materials Research Society

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