193-NM EXCIMER LASER-ASSISTED ETCHING OF POLYSILICON

193-NM EXCIMER LASER-ASSISTED ETCHING OF POLYSILICON

著者名:

掲載資料名:

Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

76

発行年:

1987

開始ページ:

147

終了ページ:

156

総ページ数:

10

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837425 [0931837421]

言語:

英語

請求記号:

M23500/76

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015561
シリーズID:	PA00000011
会議名:	Symposium on science and technology of microfabrication
回次:	1986
会議開催地:	Boston, MA, USA
会議開催年:	1986.12.04-1986.12.05

類似資料:

1 国際会議録 193-nm EXCIMER LASER-ASSISTED ETCHING OF POLYSILICON FILMS USING Cl2 Nguyen, S. V., Fridmann, S., Remberski, J. Materials Research Society	7 国際会議録 Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography Dammel, R.R., Sakamuri, R., Lee, S.-H., Rahman, M.D., Kudo, T., Romano, A.R., Rhodes, L.F., Lipian, J., Hacker, C., … SPIE-The International Society for Optical Engineering
2 国際会議録 EXCIMER LASER APPLICATIONS: POLYMER ETCHING AND METAL DEPOSITION Ritz, M., Srinivasan, V., Babu, S.V., Patel, R.C. Materials Research Society	8 国際会議録 Compaction and rarefaction of fused silica with 193-nm excimer laser exposure Algots, J.M., Sandstrom, R., Partlo, W.N., Maroevic, P., Eva, E., Gerhard, M., Linder, R., Stietz, F. SPIE-The International Society for Optical Engineering
3 国際会議録 Damage Resulting from Polysilicon Gate Etching: Effect of Electrode Age and Sequencing within a Cassette Mikulan, P.I., Awadelkarim, O.O., Fonash, S.J., Reinhardt, K.A., Rembetski, J.F. Electrochemical Society	9 国際会議録 Induced density changes in 193-nm excimer-laser-damaged silica glass: a kinetic model Allan, D.C., Araujo, R.J., Smith, C.M., Borrelli, N.F. SPIE - The International Society of Optical Engineering
4 国際会議録 Excimer laser for 157-nm lithography Stamm,U., Bragin,I., Govorkov,S.V., Kleinschmidt,J., Patzel,R., Slobodtchikov,E., Vogler,K., F.Voｦﾂ, Basting,D. SPIE - The International Society for Optical Engineering	10 国際会議録 UV and gas interactions in an enclosed 193-nm excimer laser beamline Elliot,D.J., Camp,J.C., Harlow,W.C., Dosoretz,V., Behr,D., Callahan,G.P., Flint,S. SPIE-The International Society for Optical Engineering
5 国際会議録 Performance of excimer lasers as light sources for 193-nm lithography Sedlacek,J.H.C., Doran,S.P., Fritze,M., Kunz,R.R., Rothschild,M., Uttaro,R.S., Corliss,D.A. SPIE-The International Society for Optical Engineering	11 国際会議録 ArF excimer laser for 193-nm lithography Stamm,U., Kleinschmidt,J., Heist,P., Bragin,I., Patzel,R., Basting,D. SPIE-The International Society for Optical Engineering
6 国際会議録 *SURFACE CONDITIONING ISSUES RELATED TO PATTERNING AND ETCHING Fonash, S.J., Ditizio, R.A., Gu, T., Mikulan, P.I., Awadelkarim, O.O., Collins, R.W., Rembetski, J.F., Reinhardt, K.A., … Materials Research Society	12 国際会議録 193-nm excimer laser microstepper system (Invited Paper) Rizvi,N.H., Cashmore,J.S., Solomon,C.M., Rumsby,P.T., Gower,M.C. SPIE-The International Society for Optical Engineering

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