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CHEMICALLY-ENHANCED GaAS MASKLESS ETCHING USING A NOVEL FOCUSED ION BEAM ETCHING SYSTEM WITH A CHLORINE MOLECULAR AND RADICAL BEAM

著者名:
Takado, N.
Asakawa, K.
Arimoto, H.
Morita, T.
Sugata, S.
Miyauchi, E.
Hashimoto, H.
さらに 2 件
掲載資料名:
Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
75
発行年:
1987
開始ページ:
107
終了ページ:
116
総ページ数:
10
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837418 [0931837413]
言語:
英語
請求記号:
M23500/75
資料種別:
国際会議録

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