ANNEALING KINETICS DURING RAPID AND CLASSICAL THERMAL PROCESSING OF LASER AND IMPLANTATION INDUCED DEFECTS IN SILICON

ANNEALING KINETICS DURING RAPID AND CLASSICAL THERMAL PROCESSING OF LASER AND IMPLANTATION INDUCED DEFECTS IN SILICON

著者名:

掲載資料名:

Beam-solid interactions and transient processes : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

74

発行年:

1987

開始ページ:

699

終了ページ:

704

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837401 [0931837405]

言語:

英語

請求記号:

M23500/74

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015559
シリーズID:	PA00000011
会議名:	Symposium on beam-solid interactions and transient processes
回次:	1986
会議開催地:	Boston, MA, USA
会議開催年:	1986.12.01-1986.12.04

類似資料:

1 国際会議録 RECRYSTALLIZATION KINETICS DURING FAST THERMAL ANNEALING OF PF+n IMPLANTED SILICON Adekoya, W.O., Muller, J.C., Siffert, P., Pedulli, L. Materials Research Society	7 国際会議録 Influence of Oxygen on Rapid Thermal Co-Diffusion of Phosphorus and Aluminium in Silicon Mahfoud, K., Hartiti, B., Muller, J. C., Siffert, P. MRS - Materials Research Society
2 国際会議録 ON THE ROLE OF INTERFACIAL DEFECT SITES DURING SOLID PHASE EPITAXIAL REGROWTH OF IMPLANTATION AMORPHIZED SILICON Adekoya, W. O., Hage-Ali, M., Muller, J. C., Siffert, P. Materials Research Society	8 国際会議録 RAPID THERMAL PROCESS-INDUCED DEFECTS: GETTERING OF INTERNAL CONTAMINANTS Hartiti, Bouchaib, Eichhammer, Wolfgang, Muller, Jean-Claude, Siffert, Paul Materials Research Society
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6 国際会議録 Residual defects in virgin and implanted Si after laser processing Mesli, A., Goltzene, A., Muller, J.C., Meyer, B., Schwab, C., Siffert, P. North Holland	12 国際会議録 SHALLOW-JUNCTION FORMATION BY RAPID THERMAL DIFFUSION INTO SILICON FROM DOPED SPIN-ON GLASS FILMS Ventura, L., Slaoui, A., Hartiti, B., Muller, J. C., Stuck, R., Siffert, P. MRS - Materials Research Society

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