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REACTIVE DEPOSITION OF a-SILICON AND Si-BASED ALLOYS

著者名:
Hanna, J.
Oda, S.
Shirai, H.
Miyauchi, A.
Tanabe, A.
Fukuda, K.
Ohtoshi, T.
Tokuhiro, O.
Nguyen, H.
Shimizu, I.
さらに 5 件
掲載資料名:
Materials issues in amorphous-semiconductor technology : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
70
発行年:
1986
開始ページ:
11
終了ページ:
24
総ページ数:
14
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837364 [0931837367]
言語:
英語
請求記号:
M23500/70
資料種別:
国際会議録

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