ON THE KINETICS OF OXYGEN CLUSTERING AND THERMAL DONOR FORMATION IN CZOCHRALSKI SILICON

ON THE KINETICS OF OXYGEN CLUSTERING AND THERMAL DONOR FORMATION IN CZOCHRALSKI SILICON

著者名:

掲載資料名:

Oxygen, carbon, hydrogen, and nitrogen in crystalline silicon : symposium held December 2-5, 1985, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

59

発行年:

1986

開始ページ:

195

終了ページ:

204

総ページ数:

10

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837241 [0931837243]

言語:

英語

請求記号:

M23500/59

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015545
シリーズID:	PA00000011
会議名:	Symposium on oxygen, carbon, hydrogen, and nitrogen in crystalline silicon
回次:	1985
会議開催地:	Boston, MA, USA
会議開催年:	1985.12.02-1985.12.05

類似資料:

1 国際会議録 ON THE QUESTION OF OXYGEN DIFFUSION DURING OXYGEN RELATED THERMAL DONOR FORMATION IN SILICON Oehrlein, G.S., Tan, T.Y., Kleinhenz, R.L., Lindstrom, J.L. Materials Research Society	7 国際会議録 Analysis of Oxygen Thermal Donor Formation in n-type Cz-Silicon Raft, J.M., Simoen, E., Claeys, C., Ulyashin, A., Job, R., Fahrner, W., Versluys, J., Clauws, P., Lozano, M, Campabadal, … Electrochemical Society
2 国際会議録 THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON Gosele, U., Tan,. T. Y. North-Holland	8 国際会議録 FORMATION KINETICS OF THERMAL DONORS IN SILICON Borenstien, Jeffrey T., Peak, David, Corbett, James W. Materials Research Society
3 国際会議録 Models of Oxygen Loss and Thermal Donor Formation in Silicon by the Clustering of Rapidly Diffusing Oxygen Dimers McQuaid,S.A., Newman,R.C., Muhoz,E. Trans Tech Publications	9 国際会議録 Oxygen Gettering and Thermal Donor Formation at Postimplantation Annealing of Hydrogen-Implanted Czochralski Silicon Ulyashin, A. G., Bumay, Yu. A., Fahrner, W. R., Ivanov, A. I., Job, R., Palmetshofer, L. MRS - Materials Research Society
4 国際会議録 OXYGEN ENDOR OF THERMAL DONORS IN SILICON. WEZEP,D.A.VAN, GREGORKIEWICZ,T., BEKMAN,H.H.P.Th., AMMERLAAN,C.A.J. Trans Tech Publications	10 国際会議録 Oxygen Precipitation and Thermal Donor Formation in Pb and C-Doped n-type Czochralski Silicon Neimash, M.V., Kras'ko, M., Kraitchinskii, A,, Voytovych, V., Kabaldin, O., Tsmots, V., Simoen, E., Claeys, C. Electrochemical Society
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6 国際会議録 Analysis of Oxygen Thermal Donor Formation in n-type Cz-Silicon Rafi, J.M., Simoen, E., Claeys, C., Ulyashin, A., Job, R., Fahrner, W., Versluys, J., Clauws, P., Lozano, M., … SPIE-The International Society for Optical Engineering	12 国際会議録 Formation kinetics of the Al-related shallow thernral donors:a probe for oxygen diffusion in silicon Kaczor,P., Dobaczewski,L., Gregorkiewicz,T., Ammerlaan,C.A.J. Trans Tech Publications

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