TWO-BEAM LASER RECRYSTALLIZATION OF SILICON ON AN INSULATING SUBSTRATE

TWO-BEAM LASER RECRYSTALLIZATION OF SILICON ON AN INSULATING SUBSTRATE

著者名:

掲載資料名:

Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

53

発行年:

1985

開始ページ:

71

終了ページ:

76

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837180 [0931837189]

言語:

英語

請求記号:

M23500/53

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015539
シリーズID:	PA00000011
会議名:	Symposium on semiconductor-on-insulator and thin film transistor technology
回次:	1985
会議開催地:	Boston, MA, USA
会議開催年:	1985.12.03-1985.12.06

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