KINETIC STUDIES OF SILICON-SILICON DIOXIDE INTERFACE TRAP ANNEALING USING RAPID THERMAL PROCESSING

KINETIC STUDIES OF SILICON-SILICON DIOXIDE INTERFACE TRAP ANNEALING USING RAPID THERMAL PROCESSING

著者名:

掲載資料名:

Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

52

発行年:

1985

開始ページ:

333

終了ページ:

340

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837173 [0931837170]

言語:

英語

請求記号:

M23500/52

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015538
シリーズID:	PA00000011
会議名:	Symposium on rapid thermal processing
回次:	1985
会議開催地:	Boston, MA, USA
会議開催年:	1985.12.02-1985.12.04

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