Ge+PREAMORPHIZATION OF Si: EFFECTS OF DOSE AND VERY LOW TEMPERATURE THERMAL TREATMENT ON EXTENDED DEFECT FORMATION DURING SUBSEQUENT SPE
- 著者名:
Myers, E. Rozgonyi, G.A. Sadana, D.K. Maszara, W. Wortman, J.J. Narayan, J. - 掲載資料名:
- Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 52
- 発行年:
- 1985
- 開始ページ:
- 107
- 終了ページ:
- 114
- 総ページ数:
- 8
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837173 [0931837170]
- 言語:
- 英語
- 請求記号:
- M23500/52
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society | |
Materials Research Society |
North Holland |
4
国際会議録
Semiconductor Materials Defect Diagnostics for Submicrometer Very Large Scale Integration Technology
American Chemical Society |
Materials Research Society |
Materials Research Society | |
Materials Research Society |
North-Holland |