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DIFFUSION AND ACTIVATION DURING RAPID THERMAL ANNEALING OF IMPLANTED BORON IN SILICON

著者名:
Cowern, N.E.B.
Yallup, K.J.
Godfrey, D.J.
Hasko, D.G.
McMahon, R.A.
Ahmed, H.
Stobbs, W.M.
McPhail, D.S.
さらに 3 件
掲載資料名:
Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
52
発行年:
1985
開始ページ:
65
終了ページ:
72
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837173 [0931837170]
言語:
英語
請求記号:
M23500/52
資料種別:
国際会議録

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