DIFFUSION AND ACTIVATION DURING RAPID THERMAL ANNEALING OF IMPLANTED BORON IN SILICON
- 著者名:
Cowern, N.E.B. Yallup, K.J. Godfrey, D.J. Hasko, D.G. McMahon, R.A. Ahmed, H. Stobbs, W.M. McPhail, D.S. - 掲載資料名:
- Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 52
- 発行年:
- 1985
- 開始ページ:
- 65
- 終了ページ:
- 72
- 総ページ数:
- 8
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837173 [0931837170]
- 言語:
- 英語
- 請求記号:
- M23500/52
- 資料種別:
- 国際会議録
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