TRAPPING OF INTERSTITIALS DURING ION IMPLANTATION IN SILICON

TRAPPING OF INTERSTITIALS DURING ION IMPLANTATION IN SILICON

著者名:

掲載資料名:

Beam-solid interactions and phase transformations : symposium held December 2-4, 1985, Boston, Massachusetts, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

51

発行年:

1985

開始ページ:

357

終了ページ:

362

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837166 [0931837162]

言語:

英語

請求記号:

M23500/51

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015537
シリーズID:	PA00000011
会議名:	Symposium on beam-solid interactions and phase transformations
回次:	1985
会議開催地:	Boston, MA, USA
会議開催年:	1985.12.02-1985.12.04

類似資料:

1 国際会議録 *THE ROLE OF TRAPPED INTERSTITIALS DURING RAPID THERMAL ANNEALING Pennycook, S.J., Culbertson, R.J. Materials Research Society	7 国際会議録 ION CHANNELING MEASUREMENTS ON GERMANIUM IMPLANTED AND ANNEALED SILICON Johnson, E.A., Namavar, F., Cortesi, E., Culbertson, R.J. Materials Research Society
2 国際会議録 FORMATION OF STABLE POINT DEFECTS IN ION-IMPLANTED Si Culbertson, R.J., Pennycook, S.J. Materials Research Society	8 国際会議録 CHARACTERIZATION OF ION-IMPLANTED ALUMINUM AND IRON BY SPECTROSCOPIC ELLIPSOMETRY Brodkin, J.S., Franzen, W., Culbertson, R.J., Williams, J.M. Materials Research Society
3 国際会議録 TRANSIENT ENHANCED DIFFUSION IN B+ AND P+ IMPLANTED SILICON Pennycook, S.J., Culbertson, R.J. Materials Research Society	9 国際会議録 DIFFUSION, SEGREGATION, AND RECRYSTALLIZATION IN HIGH-DOSE ION-IMPLANTED Si Pennycook, S. J. Materials Research Society
4 国際会議録 PRECIPITATION, PHASE TRANSFORMATION, AND ENHANCED DIFFUSION IN ION-IMPLANTED SILICON Pennycook, S. J., Culbertson, R. J., Berger, S. D. Materials Research Society	10 国際会議録 ION BEAM ANNEALING OF Si CO-IMPLANTED WITH Ga AND As Withrow, S.P., Holland, O.W., Pennycook, S.J., Pankove, J., Mascarenhas, A. Materials Research Society
5 国際会議録 TRANSIENT ENHANCED DIFFUSION AND GETTERING OF DOPANTS IN ION IMPLANTED SILICON Pennycook, S. J., Narayan, J., Culbertson, R. J. Materials Research Society	11 国際会議録 ION IMPLANTATION AND ANNEALING OF OXIDES White, C.W., Boatner, L.A., Skland, P.S., McHargue, C.J., Pennycook, S.J., Aziz, M.J., Farlow, G.C., Rankin, J. Materials Research Society
6 国際会議録 HIGH RESOLUTION Z-CONTRAST IMAGING AND LATTICE LOCATION ANALYSIS OF DOPANTS IN ION-IMPLANTED SILICON Pennycook, S. J., Narayan, J., Culbertson, R. J., Pogarassy, E., Batson, P. E. Materials Research Society	12 国際会議録 Phosphorus / Silicon Interstitial Annealing After Ion Implantation Keys, P. H., Brindos, R., Krishnamoorthy, V., Puga-Lambers, M., Jones, K. S., Law, Mark E. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12