DIRECT IMAGING OF “EXPLOSIVELY’ PROPAGATING BURIED MOLTEN LAYERS IN AMORPHOUS SILICON USING OPTICAL, TEM, AND ION BACKSCATTERING MEASUREMENTS

DIRECT IMAGING OF “EXPLOSIVELY’ PROPAGATING BURIED MOLTEN LAYERS IN AMORPHOUS SILICON USING OPTICAL, TEM, AND ION BACKSCATTERING MEASUREMENTS

著者名:

Lowndes, D.H.

掲載資料名:

Beam-solid interactions and phase transformations : symposium held December 2-4, 1985, Boston, Massachusetts, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

51

発行年:

1985

開始ページ:

131

終了ページ:

136

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837166 [0931837162]

言語:

英語

請求記号:

M23500/51

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015537
シリーズID:	PA00000011
会議名:	Symposium on beam-solid interactions and phase transformations
回次:	1985
会議開催地:	Boston, MA, USA
会議開催年:	1985.12.02-1985.12.04

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