ELECTRICAL CHARACTERIZATION OF ION IMPLANTED, THERMALLY ANNEALED TiN FILMS ACTING AS DIFFUSION BARRIERS ON SHALLOW JUNCTION SILICON DEVICES
- 著者名:
Armigliato, A. Finetti, M. Gabilli, E Guerri, S. Ostoja, P. Sabato, G. Scorzoni, A. - 掲載資料名:
- Ion beam processes in advanced electronic materials and device technology : symposium held April 15-18, 1985, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 45
- 発行年:
- 1985
- 開始ページ:
- 183
- 終了ページ:
- 188
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837104 [0931837103]
- 言語:
- 英語
- 請求記号:
- M23500/45
- 資料種別:
- 国際会議録
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