CHARACTERIZATION OF EPITAXIAL CoSi2 FILMS GROWN ON Si
- 著者名:
- 掲載資料名:
- Advanced photon and particle techniques for the characterization of defects in solids : symposium held November 27-29, 1984, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 41
- 発行年:
- 1985
- 開始ページ:
- 355
- 終了ページ:
- 362
- 総ページ数:
- 8
- 出版情報:
- Pittsburgh: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837067 [0931837065]
- 言語:
- 英語
- 請求記号:
- M23500/41
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
ON THE CRITIAL LAYER THICKNESS OF STRAINED-LAYER HETERO-EPITAXIAL CoSi2 FILMS ONF < 111 > Si
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Narosa Publishing House |
Materials Research Society |
Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |