Blank Cover Image

GROWTH AND COMPOSITION OF LPCBD SILICON OXYNITRIDE FILMS

著者名:
掲載資料名:
Applied materials characterization : symposium held April 15-18, 1985, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
48
発行年:
1985
開始ページ:
395
終了ページ:
408
総ページ数:
14
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837135 [0931837138]
言語:
英語
請求記号:
M23500/48
資料種別:
国際会議録

類似資料:

1 国際会議録 Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films

Naskar, S., Bower, C. A., Yadon, L. N., Wolter, S. D., Stoner, B. R., Glass, J. T.

Materials Research Society
7 国際会議録 Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique

Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. …

MRS-Materials Research Society
2 国際会議録 COMPOSITIONAL DETERMINATION OF SILICON OXYNITRIDE FILMS

Hatton, Kenneth S., Wachtman, Jr., John B., Haber, Richard A., Wilkens, Barry

Materials Research Society
8 国際会議録 Compositionally Inhomogenous Silicon Oxynitride Dielectrics

Wager, J.F., Lim, S., Ryu, J.H., Marlia, J., Remley, K., Lite, K., Plant, T.K., Weisshaar, A., Casas, L.M.

Electrochemical Society
3 国際会議録 Microstructure of Ultra-High Dose Self-Implanted Silicon

Zhu, X. F., Williams, J. S., Llewellyn, D. J., McCallum, J. C.

MRS - Materials Research Society
9 国際会議録 CHANNELING CONTRAST MICROSCOPY: A POWERFUL TOOL FOR EXAMINING SEMICONDUCTOR STRUCTURES

McCallum, J.C., Brown, R.A., Nygren, J.S., Williams, J.S., Olson, G.L.

Materials Research Society
4 国際会議録 AMORPHOUS TO POLYCRYSTALLINE TRANSFORMATION IN HIGH DOSE ION IMPLANTED SILICON

Nygren, E., McCallum, J. C., Thornton, R., Williams, J. S., Olson, G. L.

Materials Research Society
10 国際会議録 Improved Optical Loss Characteristics of PECVD Silicon Oxynitride Films Using Low Frequency Plasma

Naskar, S., Bower, C.A., Wolter, S.D., Stoner, B.R., Glass, J.T.

Materials Research Society
5 国際会議録 Instability of Nanocavities in Disordered and Amorphous Silicon Under Ion Irradiation

Zhu, X., Williams, J. S., McCallum, J. C.

MRS - Materials Research Society
11 国際会議録 The Thermal Growth of Silicon Gate Oxynitrides

Ellis, K.A., Carr, E.C., Buhrman, R.A.

Electrochemical Society
6 国際会議録 *CRYSTALLIZATION OF INDIUM IMPLANTYED AMORPHOUS SILICON

Nygren, E., Williams, J.S., Pogany, A., Elliman, R.G., Olson, G.L., McCallum, J.C.

Materials Research Society
12 国際会議録 GROWTH OF ORIENTED DIAMOND FILMS ON SILICON SUBSTRATES

Southworth, P., Buhaenko, D.S., Ellis, P.J., Jenkins, C.E., Stoner, B.R.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12