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THE THICKNESS EFFECT ON THE MICROSTRUCTURE OF SPUTTERED FILMS STUDIED BY A NEW X-RAY DIFFRACTION METHOD

著者名:
Hecq, M.  
掲載資料名:
Applied materials characterization : symposium held April 15-18, 1985, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
48
発行年:
1985
開始ページ:
55
終了ページ:
62
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837135 [0931837138]
言語:
英語
請求記号:
M23500/48
資料種別:
国際会議録

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