ELECTRON TRAPPING/DETRAPPING IN THIN SiO2 UNDER HIGH FIELDS
- 著者名:
- Wu, N., R.
- Chiao, S.
- Wang, C.
- Bhushan, B. ( Yang, C. Y. )
- 掲載資料名:
- Thin films : the relationship of structure to properties : symposium held April 15-17, 1985, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 47
- 発行年:
- 1985
- 開始ページ:
- 99
- 終了ページ:
- 106
- 総ページ数:
- 8
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837128 [093183712X]
- 言語:
- 英語
- 請求記号:
- M23500/47
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Electrochemical Society |
2
国際会議録
Trapping And Detrapping Of H In Si: Impact On Diffusion Properties And Solar Cell Processing
Materials Research Society |
Trans Tech Publications |
MRS - Materials Research Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
国際会議録
Binary HfO2:SiO2 Used as High-k Gate Oxide Material in Combinatorial Material Library Method
Materials Research Society |
Materials Research Society |
Trans Tech Publications |
Trans Tech Publications |