LOW TEMPERATURE PLASMA ANODIZATION OF SILICIDES

LOW TEMPERATURE PLASMA ANODIZATION OF SILICIDES

著者名:

掲載資料名:

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

38

発行年:

1985

開始ページ:

443

終了ページ:

450

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837036 [0931837030]

言語:

英語

請求記号:

M23500/38

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015524
シリーズID:	PA00000011
会議名:	Symposium on plasma synthesis and etching of electronic materials
回次:	1984
会議開催地:	Boston, MA, USA
会議開催年:	1984.11.26-1984.11.30

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2 国際会議録 *MECHANISMS OF PLASMA OXIDATION OF Si Siejka, J., Perriere, J. Materials Research Society	8 国際会議録 In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation Lavoje, C., Purtell, R., Cola, C., Detavernier, C., Desjardins, P., Jordan-Sweet, J., Cabral, C., Jr., d'Heurle, F.M., … Electrochemical Society
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