CHEMICAL VAPOR DEPOSITION OF SILICON INSULATING FILMS INDUCED WITH PERPENDICULAR ELECTRON BEAM

CHEMICAL VAPOR DEPOSITION OF SILICON INSULATING FILMS INDUCED WITH PERPENDICULAR ELECTRON BEAM

著者名:

掲載資料名:

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

38

発行年:

1985

開始ページ:

357

終了ページ:

362

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837036 [0931837030]

言語:

英語

請求記号:

M23500/38

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015524
シリーズID:	PA00000011
会議名:	Symposium on plasma synthesis and etching of electronic materials
回次:	1984
会議開催地:	Boston, MA, USA
会議開催年:	1984.11.26-1984.11.30

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