MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING

MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING

著者名:

掲載資料名:

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

38

発行年:

1985

開始ページ:

157

終了ページ:

162

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837036 [0931837030]

言語:

英語

請求記号:

M23500/38

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015524
シリーズID:	PA00000011
会議名:	Symposium on plasma synthesis and etching of electronic materials
回次:	1984
会議開催地:	Boston, MA, USA
会議開催年:	1984.11.26-1984.11.30

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1 国際会議録 KINETICS OF REACTIVE ION ETCHING OF POLYMERS IN AN OXYGEN PLASMA: THE IMPORTANCE OF DIRECT REACTIVE ION ETCHING Graham, Sandra W., Steinbruchel, Christoph MRS - Materials Research Society	7 国際会議録 Magnetron dry etching for photonic device fabrication Arnot, H. E. G., Zappe, H. P., Epler, J. E., Graf, B., Widmer, R., Lehmann, H. W. MRS - Materials Research Society
2 国際会議録 MECHANISM OF REACTIVE ION ETCHING OF POLYMERIC FILMS IN OXYGEN-BASED PLASMAS Graham, Sandra W., Steinbruchel, Christoph Materials Research Society	8 国際会議録 UNIVERSAL ENERGY DEPENDENCE OF SPUTTERING YIELDS AT LOW ION ENERGY Muri, J., Steinbruchel, Ch. Materials Research Society
3 国際会議録 REACTIVE ION ETCHING OF COPPER WITH SiCl4 AND CCl2F2 Howard, B.J., Wolterman, S.K., Yoo, W.J., Gittleman, B., Steinbruchel, Ch. Materials Research Society	9 国際会議録 Electrochemical Study of an Al-Cu Alloy Exposed to Reactive Ion Etching Brusic, V., Yang, C.H. Electrochemical Society
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5 国際会議録 REACTIVE ION ETCHING MODEL FOR SILICON DIOXIDE Fortuno, Guadalupe Materials Research Society	11 国際会議録 EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING Park, H.-H., Kwon, K.-H., Lee, S.-H., Nahm, S., Lee, J.-W., Koak, B.-H., Suh, K.-S., Kwon, O.-J., Lee, J.-L., Yeom, … MRS - Materials Research Society
6 国際会議録 Microporous silicon: Formation mechanism and preparation method Lehmann,V. Kluwer Academic Publishers	12 国際会議録 MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society

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