CHARACTERISTICS OF AMORPHOUS SILICON BASED ALLOY FIELD EFFECT TRANSISTORS
- 著者名:
- 掲載資料名:
- Comparison of thin film transistor and SOI technologies : symposium held February 1984 in Albuquerque, New Mexico, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 33
- 発行年:
- 1984
- 開始ページ:
- 307
- 終了ページ:
- 312
- 総ページ数:
- 6
- 出版情報:
- New York: North Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008992 [0444008993]
- 言語:
- 英語
- 請求記号:
- M23500/33
- 資料種別:
- 国際会議録
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3
国際会議録
Temperature and Frequency Dependent Characteristics of Amorphous Silicon Thin Film Transistors
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Effect of Stress on the Density of Deep Localized States in Amorphous Silicon Thin Film Transistors
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