CHARACTERIZATION OF CMOS DEVICES IN 0.5-μm SILICON-ON-SAPPHIRE FILMS MODIFIED BY SOLID PHASE EPITAXY AND REGROWTH (SPEAR)
- 著者名:
- 掲載資料名:
- Comparison of thin film transistor and SOI technologies : symposium held February 1984 in Albuquerque, New Mexico, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 33
- 発行年:
- 1984
- 開始ページ:
- 35
- 終了ページ:
- 40
- 総ページ数:
- 6
- 出版情報:
- New York: North Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008992 [0444008993]
- 言語:
- 英語
- 請求記号:
- M23500/33
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
MRS-Materials Research Society |
2
国際会議録
Conformal Electroless Copper Deposition for sub-0.5 μm Interconnect Wiring of Very High Aspect Ratio
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society |