MEGAVOLT BORON AND ARSENIC IMPLANTATION INTO SILICON
- 著者名:
Bryne, P. F. Cheung, N. W. Tam, S. Hu, C. Shih, Y. C. Washburn, J. Starthman, M. - 掲載資料名:
- Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 27
- 発行年:
- 1984
- 開始ページ:
- 253
- 終了ページ:
- 258
- 総ページ数:
- 6
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008695 [0444008691]
- 言語:
- 英語
- 請求記号:
- M23500/27
- 資料種別:
- 国際会議録
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