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HIGH CURRENT DENSITY IMPLANTATION AND ION BEAM ANNELAING IN Si

著者名:
掲載資料名:
Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
27
発行年:
1984
開始ページ:
235
終了ページ:
240
総ページ数:
6
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444008695 [0444008691]
言語:
英語
請求記号:
M23500/27
資料種別:
国際会議録

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