TiN as a diffusion barrier for III-V metallization
- 著者名:
- Houghton, D. C.
- 掲載資料名:
- Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 25
- 発行年:
- 1984
- 開始ページ:
- 149
- 終了ページ:
- 156
- 総ページ数:
- 8
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444009050 [0444009051]
- 言語:
- 英語
- 請求記号:
- M23500/25
- 資料種別:
- 国際会議録
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10
国際会議録
Process integration of TDEAT-based MOCVD TiN as diffusion barrier for advanced Metallization
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