Oxygen influence on titanium silicide formation
- 著者名:
Bentini, G. G. Berti, M. Cohen, C. Drigo, A. V. Guerri, S. Nipoti, R. Siejka, J. - 掲載資料名:
- Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 25
- 発行年:
- 1984
- 開始ページ:
- 137
- 終了ページ:
- 142
- 総ページ数:
- 6
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444009050 [0444009051]
- 言語:
- 英語
- 請求記号:
- M23500/25
- 資料種別:
- 国際会議録
類似資料:
North-Holland | |
Materials Research Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
11
国際会議録
The Influence of Stress on the Growth of Titanium Silicide Thin Films on (001) Silicon Substrates
MRS - Materials Research Society |
Kluwer Academic Publishers |
North-Holland |