Blank Cover Image

INFLUENCE OF RAPID THERMAL ANNEALING OF SHALLOW BF2 IMPLATATION INTO PRE-AMORPHIZED SILICON

著者名:
Maszara, W.
Carter, C.
Sadana, D. K.
Liu, J.
Ozguz, V.
Wortman, J.
Rozgonyi, G. A.
さらに 2 件
掲載資料名:
Energy beam-solid interactions and transient thermal processing : symposium held November 1983 in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
23
発行年:
1984
開始ページ:
285
終了ページ:
292
総ページ数:
8
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009036 [0444009035]
言語:
英語
請求記号:
M23500/23
資料種別:
国際会議録

類似資料:

1 国際会議録 GERMANIUM IMPLANTATION INTO SILICON: AN ALTERNATE PRE-AMORPHIZATION/RAPID THERMAL ANNEALING PROCEDURE FOR SHALLOW JUNCTION TECHNOLOGY

Sadana, D. K., Myers, E., Liu, J., Finstaad, T., Rozgonyi, G. A.

North-Holland
7 国際会議録 Influence of HCL on Rapid Thermal Oxides

Hames, G. A., Beck, S. E., Gilicinski, A. G., Henson, W. K., Wortman, J. J.

MRS - Materials Research Society
2 国際会議録 DYNAMIC ANNEALING PHENOMENA AND THE ORIGIN OF RTA-INDUCED “HAIRPIN" DISLOCATIONS

Maszara, W., Sadana, D. K., Rozgonyi, G. A., Sands, T., Washburn, J., Wortman, J. J.

Materials Research Society
8 国際会議録 HEATING RATE EFFECTS IN RAPID THERMAL ANNEALING OF ARSENIC IMPLANTED SILICON

Souza, J. P. de, Fichtner, P. F. P., Sadana, D. K.

MRS - Materials Research Society
3 国際会議録 Ge+PREAMORPHIZATION OF Si: EFFECTS OF DOSE AND VERY LOW TEMPERATURE THERMAL TREATMENT ON EXTENDED DEFECT FORMATION DURING SUBSEQUENT SPE

Myers, E., Rozgonyi, G.A., Sadana, D.K., Maszara, W., Wortman, J.J., Narayan, J.

Materials Research Society
9 国際会議録 INFLUENCE OF SURFACE PRE-CLEANING ON ELECTRICAL PROPERTIES OF RAPID THERMAL OXIDE AND RAPID THERMAL CHEMICAL VAPOR DEPOSITION OXIDE

Xu, Xiaoli, Kuehn, R.T., Melzak, J.M., Hames, G.A., Wortman, J.J., Ozturk, M.C., Nemanich, R.J., Harris, G., Maher, D.

Materials Research Society
4 国際会議録 TEMPERATURE DEPENDENT AMORPHIZATION OF SILICON DURING SELF IMPLANTATION

Maszara, W.P., Rozgonyi, G.A., Simpson, L., Wortman, J.J.

Materials Research Society
10 国際会議録 *EXTENDED DEFECTS IN AMORPHIZED AND RAPID THERMALLY ANNEALED SILICON

Maher, D.M., Knoell, R.V., Ellington, M.B., Hull, R., Jacobson, D.C., Joy, D.C.

Materials Research Society
5 国際会議録 RAPID THERMAL ANNEALING OF PRE-AMORPHIZED B AND BF2-IMPLANTED SILICON

Calder, I. D., Naguib, H. M., Houghton, D.

Materials Research Society
11 国際会議録 STABILITY OF HEAVILY DOPED Si FORMED BY As+ IMPLANTATION AND RAPID THERMAL ANNEALING

Numan, M.Z., Lu, Z.H., Chu, W.K., Fathy, D., Wortman, J.J.

Materials Research Society
6 国際会議録 *DEFECT STRUCTURES AND ELETRICAL BEHAVIOR OF RAPID THERMALLY ANNEALED ION IMPLANTED SILICON

Sadana, D. K.

Materials Research Society
12 国際会議録 Rapid Thermal Chemical Vapor Deposition of Polycrystalline Silicon-Germanium Films on SiO2 and Their Properties

Li, V. Z-Q, Mirabedini, M. R., Kuehn, R. T., Gladden, D., Batchelor, D., Christenson, K., Wortman, J. J., Ozturk, M. C., …

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12