Blank Cover Image

RELAXATION BEHAVIOR OF METASTABLE As AND P CONCENTRATIONS IN Si AFTER PULSED AND CW LASER ANNEALING

著者名:
掲載資料名:
Energy beam-solid interactions and transient thermal processing : symposium held November 1983 in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
23
発行年:
1984
開始ページ:
235
終了ページ:
240
総ページ数:
6
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009036 [0444009035]
言語:
英語
請求記号:
M23500/23
資料種別:
国際会議録

類似資料:

1 国際会議録 Behavior of metastable Te donor concentrations in Q-switched ruby laser annealed GaAs

Pianetta, P., Amano, J., Woolhouse, G., Stolte, C.A.

North Holland
7 国際会議録 Zone refining of nonsubstitutional impurities during pulsed laser annealing

White, C.W., Naramoto, H., Williams, J.M., Narayan, J., Appleton, B.R., Wilson, S.R.

North Holland
2 国際会議録 CLUSTERING KINETICS OF ARSENIC AND PHOSPHORUS IN LASER ANNEALED SILICON

Goetzlich, Josef

Materials Research Society
8 国際会議録 ACTIVATION OF Si-N MODES IN SILICON BY PULSED-LASER ANNEALING

Stein, H. J., Peercy, P. S., Hills, C. R.

Materials Research Society
3 国際会議録 THE KINETICS OF DAMAGE REMOVAL, METASTABLE CARRIER CONCENTRATION RELAXATION AND SECONDARY DEFECT EVOLUTION DURING RTA

Li, Xu, Peihsin, Tsien, Zhijian, Li

Materials Research Society
9 国際会議録 Influence of RTP on Vacancy Concentrations

Jacob, M., Pichler, P., Wohs, M., Ryssel, H., Falster, R.

MRS - Materials Research Society
4 国際会議録 Annealing of Aluminum Implanted 4H-SiC: Comparison of Furnace and Lamp Annealing

Rambach, M., Bauer, A. J., Frey, L., Friedrichs, P., Ryssel, H.

Trans Tech Publications
10 国際会議録 Nonequilibrium crystal growth during pulsed laser annealing

White, C.W.

North Holland
5 国際会議録 Residual defects after pulsed laser annealing of ion implanted silicon

Mesli, a., Muller, J.C., Salles, D., Siffert, P.

North Holland
11 国際会議録 AN INVESTIGATION OF VACANCY CONCENTRATIONS IN BULK SILICON

Zimmermann, Horst, Ryssel, H.

Materials Research Society
6 国際会議録 N-CONCENTRATION DEPENDENCE OF THERMAL ANNEALING BEHAVIOR OF SUBSTITUTIONAL IMPURITIES IN PULSED-LASER ANNEALED SILICON.

ITOH,H., MURAKAMI,K., TAKITA,K., MASUDA,K.

Trans Tech Publications
12 国際会議録 Relaxation of Thermal Residual Stress in Laser Irradiated Fused Silica by Annealing Process

R.Q. Li, P. Yao, W. Wang, J. Wang, C.Z. Huang, Z.H. Yang, Y. Liu

Trans Tech Publications
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12