A COMPARISON OF ELLIPSOMETER AND RBS ANALYSIS OF IMPLANT DAMAGE IN SILICON
- 著者名:
- Paulson, W. M.
- Wilson, S. R. ( Semiconductor Research and Development Labs., Motorola, Inc., Phoenix, AZ; )
- White, C. W.
- Appleton, B. R. ( Oak Ridge Nationa Laboratory, Oak Ridge, TN )
- 掲載資料名:
- Defects in semiconductors II : symposium held November 1982 in Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 14
- 発行年:
- 1983
- 開始ページ:
- 523
- 終了ページ:
- 528
- 総ページ数:
- 6
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008121 [0444008128]
- 言語:
- 英語
- 請求記号:
- M23500/14
- 資料種別:
- 国際会議録
類似資料:
North Holland |
Martinus Nijhoff Publishers |
North-Holland | |
3
国際会議録
GRAIN GROWTH PROCESSES DURING TRANSIENT ANNEALING OF As-IMPLANTED, POLYCRYSTALLINE-SILICON FILMS
Materials Research Society |
Materials Research Society |
North-Holland |
North Holland |
North-Holland |
North-Holland |
North-Holland |
North-Holland |